Decoration member

ABSTRACT

The present disclosure relates to a decoration member comprising: a color expression layer comprising a light reflection layer and a light absorption layer provided on the light reflection layer; and a substrate provided on one surface of the color expression layer, in which the light absorption layer comprises a copper nickel oxide (Cu a Ni b O x ).

This application is a National Phase entry pursuant to 35 U.S.C. § 371of International Application No. PCT/KR2019/007241 filed on Jun. 14,2019, and claims priority to and the benefit of Korean PatentApplication No. 10-2018-0069234 filed in the Korean IntellectualProperty Office on Jun. 15, 2018 and Korean Patent Application No.10-2018-0132066 filed in the Korean Intellectual Property Office on Oct.31, 2018, the entire contents of which are incorporated herein byreference.

TECHNICAL FIELD

This application relates to a decoration member.

BACKGROUND ART

In cosmetic containers, various mobile devices, and home appliances, adesign of a product, for example, a color, a shape, and a pattern play abig role in adding a value of the product to customers in addition to afunction of the product. Product preference and price also depend on thedesign.

As an example, in the case of a cosmetic compact case, various colorsand color senses are implemented in various methods and applied to theproduct. There are a method for giving the color to a case materialitself and a method for attaching a decoration film that implements thecolor and the shape to the case material to give the design.

Expression of the color in the existing decoration film is implementedthrough a method comprising printing, deposition, and the like. Whenexpressing heterogeneous colors on a single surface, the color should beprinted two or more times, and when it is desired to apply a variety ofcolors to a three-dimensional pattern, it is practically difficult toimplement the expression of the colors. Further, in the existingdecoration film, the color is fixed according to a viewing angle andeven though there is a slight change, the change is limited to adifference degree of the color sense.

PRIOR ART DOCUMENT Patent Document

Patent Document 1: Korean Patent Unexamined Publication No.10-2010-0135837

DETAILED DESCRIPTION OF THE INVENTION Technical Problem

This application has been made in an effort to provide a decorationmember.

Technical Solution

The present specification provides a decoration member which comprises:a color expression layer comprising a light reflection layer and a lightabsorption layer provided on the light reflection layer, and a substrateprovided on one surface of the color expression layer, in which thelight absorption layer comprises a copper nickel oxide(Cu_(a)Ni_(b)O_(x)) and when a component analysis is performed at anyone point of the light absorption layer, ω expressed by Equation 1 belowis 0.71 or more and 3 or less.

$\begin{matrix}{\omega = {( T_{x} ) \times ( \sigma_{x} )}} & \lbrack {{Equation}\mspace{14mu} 1} \rbrack \\{{f( T_{1} )} = {\frac{T_{1}}{T_{0}}( {0 < T_{1} \leq T_{0}} )}} & \lbrack {{Equation}\mspace{14mu} 2} \rbrack \\{{f( T_{1} )} = {f( {T_{1} + {n \times T_{0}}} )}} & \; \\{\sigma_{x} = {\frac{a + b}{x} \times 1.2}} & \lbrack {{Equation}\mspace{14mu} 3} \rbrack\end{matrix}$

In Equation 1, T_(x) represents a function value depending on T₁ of afunction represented by the f(T₁), n represents a positive integer of 1or more, and σ_(x) is represented by Equation 3 above,

in Equation 2 above, T₁ represents a thickness of the light absorptionlayer comprising any one point of the light absorption layer in whichthe component analysis is performed and T₀ is 60 nm, and

in Equation 3 above, the a means an element content ratio of copper(Cu), the b means the element content ratio of nickel (Ni), and the xmeans the element content ratio of oxygen (O).

Advantageous Effects

According to an embodiment of the present specification, a decorationmember comprises a light absorbing layer in which a content of eachelement is adjusted at a specific ratio in addition to a copper nickeloxide, thereby expressing a color of a cool tone.

This application provides a decoration member which has dichroismshowing a difference color according to a viewing direction and hasimproved visibility of the dichroism.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 illustrates a decoration member according to an embodiment of thepresent specification.

FIG. 2 illustrates a method for distinguishing a light absorption layerand a light reflection layer.

FIG. 3 illustrates one point of the light absorption layer and athickness of the light absorption layer comprising the same.

FIG. 4 illustrates a principle of interference of light in the lightabsorption layer and the light reflection layer.

FIGS. 5 to 13 illustrate a decoration member according to an embodimentof the present invention.

FIGS. 14 to 31 illustrate a shape of a pattern layer.

FIGS. 32 and 33 illustrate a warm tone and a cool tone.

FIG. 34 illustrates a color according to an evaluation example (colorevaluation).

FIG. 35 is a graph according to Equation 2.

BEST MODE

Hereinafter, the present specification will be described in detail.

In the present specification, “or” means “and/or” when “or” selectivelycomprises them listed or comprises all of them listed, unless otherwisedefined.

In the present specification, “layer” means covering 70% or more of anarea in which the layer exists. Preferably, the “layer” means covering75% or more and more preferably 80% or more.

In the present specification, a “thickness” of a layer means a shortestdistance from a lower surface to an upper surface of the layer.

In the present specification, a color represented by a decoration membermay be defined by spectral characteristics of a light source,reflectance of an object, and color viewing efficiency of an observer.

For objective color expression, color measurement is required atstandard light sources and a standard observer, and a color is expressedin coordinates of a color space.

The color of the decoration member may be represented by CIE Lab (L *a * b *) coordinates or LCh coordinates which provide a visually uniformcolor space. L* represents lightness, +a* represents redness, −a*represents greenness, +b* represents yellowness, −b* representsblueness, and C* and h* will be described later. A total colordifference according to a position of the observation in the color spacemay be expressed as ΔE·ab=√{square root over ((ΔL)²+(Δa)²+(Δb)²)}.

The color measurement may adopt a spectrophotometer (CM-2600d,manufactured by Konica Minolta Co., Ltd.) and reflectance of a samplemay be optically analyzed and the reflectance for each wavelength may berepresented through a spectrophotometer, and as a result, a spectralreflectance graph and a converted color coordinate may be obtained. Inthis case, data is obtained at a viewing angle of 8 degrees and thedecoration member is measured in horizontal and vertical directions inorder to view dichroism of the decoration member.

The viewing angle as an angle formed by a straight line d1 in a normaldirection of the surface of a color expression layer of the decorationmember and a straight line d2 passing through the spectrophotometer andone point of the decoration member to be measured generally has a rangeof 0 to 90 degrees.

A case where the viewing angle is 0 degree means measuring in adirection which is the same as the normal direction of the surface ofthe color expression layer of the decoration member.

In the present specification, a “light absorption layer” and a “lightreflection layer” are layers having relative physical properties, thelight absorption layer may mean a layer having a higher light absorptionthan the light reflection layer and the light reflection layer may meana layer having a higher light reflectivity than the light absorptionlayer.

Each of the light absorption layer and the light reflection layer may beconstituted by a single layer or constituted by two layers or more ofmultiple layers.

In the present specification, the light absorption layer and the lightrefection layer are named according to functions thereof. In regard tolight having a specific wavelength, a layer that reflects lightrelatively much may be represented by the light reflection layer and alayer that reflects light relatively little may be represented by thelight absorption layer.

FIG. 1 illustrates a lamination structure of a decoration memberaccording to an embodiment of the present specification. In FIG. 1, adecoration member comprising a color expression layer 100 and asubstrate 101 is illustrated. The color expression layer 100 comprises alight reflection layer 201 and a light absorption layer 301. AlthoughFIG. 1 illustrates that the substrate 101 is provided on the lightabsorption layer 301 of the color expression layer 100, the substrate101 may be provided on the light reflection layer 201.

Through FIG. 2, the light absorption layer and the light reflectionlayer will be described. In the decoration member of FIG. 2, each layeris laminated in the order of an L_(i−1) layer, an L_(i) layer, and anL_(i+1) layer based on a light input direction, and an interface I_(i)is positioned between the L_(i−1) layer and the L_(i) layer and aninterface I_(i+1) is located between the L_(i) layer and the L_(i+1)layer.

When irradiating light having a specific wavelength in a directionperpendicular to each layer so that thin film interference does notoccur, the reflectance at the interface I_(i) may be expressed byEquation 1 below.

$\begin{matrix}\frac{\lbrack {{n_{i}(\lambda)} - {n_{i - 1}(\lambda)}} \rbrack^{2} + \lbrack {{k_{i}(\lambda)} - {k_{i - 1}(\lambda)}} \rbrack^{2}}{\lbrack {{n_{i}(\lambda)} + {n_{i - 1}(\lambda)}} \rbrack^{2} + \lbrack {{k_{i}(\lambda)} + {k_{i - 1}(\lambda)}} \rbrack^{2}} & \lbrack {{Equation}\mspace{14mu} 1} \rbrack\end{matrix}$

In Equation 1, n_(i)(λ) denotes a refractive index according to awavelength λ of an i-th layer and k_(i)(λ) denotes an extinctioncoefficient according to the wavelength λ of the i-th layer. Theextinction coefficient is a measure that may define how strongly atarget material absorbs light at a specific wavelength, and thedefinition is described below.

By applying Equation 1 above, when a sum of the reflectances for eachwavelength at the interface I_(i) calculated at each wavelength isrepresented by R_(i), the R_(i) is represented by Equation 2 below.

$\begin{matrix}{R_{i} = \frac{\sum\limits_{\lambda = {380\mspace{11mu} n\; m}}^{\lambda = {780\mspace{11mu} n\; m}}{\frac{\lbrack {{n_{i}(\lambda)} - {n_{i - 1}(\lambda)}} \rbrack^{2} + \lbrack {{k_{i}(\lambda)} - {k_{i - 1}(\lambda)}} \rbrack^{2}}{\lbrack {{n_{i}(\lambda)} + {n_{i - 1}(\lambda)}} \rbrack^{2} + \lbrack {{k_{i}(\lambda)} + {k_{i - 1}(\lambda)}} \rbrack^{2}}\Delta \; \lambda}}{\sum\limits_{\lambda = {380\mspace{11mu} n\; m}}^{\lambda = {780\mspace{11mu} n\; m}}\; {\Delta \; \lambda}}} & \lbrack {{Equation}\mspace{20mu} 2} \rbrack\end{matrix}$

Hereinafter, the decoration member comprising the light reflection layerand the light absorption layer described above will be described.

The present specification provides a decoration member which comprises:a color expression layer comprising a light reflection layer and a lightabsorption layer provided on the light reflection layer, and a substrateprovided on one surface of the color expression layer, in which thelight absorption layer comprises a copper nickel oxide(Cu_(a)Ni_(b)O_(x)) and when a component analysis is performed at anyone point of the light absorption layer, ω expressed by Equation 1 belowis 0.71 or more and 3 or less.

$\begin{matrix}{\omega = {( T_{x} ) \times ( \sigma_{x} )}} & \lbrack {{Equation}\mspace{14mu} 1} \rbrack \\{{f( T_{1} )} = {\frac{T_{1}}{T_{0}}( {0 < T_{1} \leq T_{0}} )}} & \lbrack {{Equation}\mspace{14mu} 2} \rbrack \\{{f( T_{1} )} = {f( {T_{1} + {n \times T_{0}}} )}} & \; \\{\sigma_{x} = {\frac{a + b}{x} \times 1.2}} & \lbrack {{Equation}\mspace{14mu} 3} \rbrack\end{matrix}$

In Equation 1, T_(x) represents a function value depending on T₁ of afunction represented by the f(T₁), n represents a positive integer of 1or more, and σ_(x) is represented by Equation 3 above,

in Equation 2 above, T₁ represents a thickness of the light absorptionlayer comprising any one point of the light absorption layer in whichthe component analysis is performed and T₀ is 60 nm, and

in Equation 3 above, the a means an element content ratio of copper(Cu), the b means the element content ratio of nickel (Ni), and the xmeans the element content ratio of oxygen (O). For example, when thecontents of copper (Cu), nickel (Ni) and oxygen (O) at one point are57.5%, 9.8%, and 39.7%, respectively, a, b, and c may be expressed as0.575, 0.098, and 0.397, respectively.

In the present specification, a content ratio of a specific element maymean an atomic percentage (at %) of a specific element at any one pointof the light absorption layer in which the component analysis isperformed.

In the decoration member according to an embodiment of the presentspecification, a light absorbing layer comprises copper nickel oxide(Cu_(a)Ni_(b)O_(c)), by controlling the content ratio of each element ofcopper nickel oxide and adjusting the thickness of the light absorptionlayer to a specific range, the cool tone may be observed through thelight absorption layer. In this case, a relational expression betweenthe content ratio of each element of the copper nickel oxide and thethickness of the light absorption layer may be represented by a cooltone parameter ω represented by Equation 1 above. The cool toneparameter may be represented by ω_(c). A subscript w of the we means thecool tone.

In an embodiment of the present specification, ω represented by Equation1 above with respect to any one point x of the light absorption layermay be 0.71 or more and 2 or less, 0.8 or more and 1.5 or less, or 0.85or more and 1.3 or less. When satisfying the numerical range, the cooltone may be observed through the light absorption layer and a colordesired by a user may be easily indicated among the cool tones.

In the present specification, the ‘any one point of the light absorptionlayer’ may mean any one point on the surface or inside the lightabsorption layer.

In an embodiment of the present specification, the T_(x) represents athickness parameter expressed by Equation 2 above. In the lightabsorption layer, the warm tone or the cool tone are alternately shownas the thickness is changed and the thickness has a predetermined periodT₀ and the color is changed. In this case, the T_(x) may mean a ratio ofa light absorption layer thickness T₁ at any one point to thepredetermined period T₀ of the thickness of the light absorption layer.For example, when the predetermined period of the thickness is 60 nm,values of the T_(x) when the thickness of the light absorption layer is60 nm, 120 nm, and 180 nm are the same as 1.

In Equation 2 above, T₁ represents the thickness of the light absorptionlayer comprising any one point of the light absorption layer. T₁ meansthe thickness of the light absorption layer comprising one point whenone point of the light absorption layer is selected. When a crosssection of the decoration member is observed through a scanning electronmicroscope (SEM) or the like, the interface between the light reflectionlayer and the light absorption layer may be confirmed, and it may beconfirmed that the layer containing the copper nickel oxide is a lightabsorption layer through the component analysis. In this case, any onepoint of the light absorption layer may be selected, and the thicknessof the light absorption layer comprising any one point may be calculatedand applied as T₁.

Equation 2 above shows a periodic function f(T₁) according to thethickness T₁ of the light absorption layer. The same f(T₁) value isshown according to the period T₀. This is illustrated in FIG. 35.According to FIG. 35, f(T₁) appearing in the range of (0<T₁≤T₀) appearsrepeatedly with a constant period T₀. For example, f(0.5T₀) in the caseof T₁=0.5T₀ and f(1.5T₀) in the case of T=0.5T₀+T₀ have the same valueas 0.5.

In an embodiment of the present specification, the a, b, and x may bethe same as each other or different from each other and each of the a,b, and x may have a value of more than 0 and less than 1.

According to an embodiment of the present specification, a+b+x=1 may beestablished.

The thickness T₁ may mean a length in a thickness direction of the lightabsorption layer in a cross section in a direction perpendicular to asurface direction of the light absorption layer while comprising any onepoint of the light absorption layer.

FIG. 3 illustrates a method for determining one point and the thicknessof the light absorption layer. When any one point (a red point of FIG.3) of the light absorption layer is selected, a content ratio parameterexpressed by Equation 3 is calculated through the component analysis ofthis point and a width of a line segment which is perpendicular to thesurface direction of the light absorption layer among the line segmentspassing through this point is calculated to calculate the thickness T₁.

Further, the T₁ may be achieved by adjusting process pressure used fordeposition at the time of forming the light absorption layer, a flowrate of reactive gas to plasma gas, voltage, a deposition time, or atemperature.

In the decoration member of the present invention, the cool tone or thewarm tone repeatedly appears with a constant period according to athickness change of the light absorption layer. In this case, T₀ may beexpressed as a “period of the thickness of the light absorption layer inwhich the cool tone repeatedly appears”.

The component analysis of the light absorption layer may adopttransmission X-ray component analysis.

In Equation 3 above, the a means an element content ratio of copper(Cu), the b means the element content ratio of nickel (Ni), and the xmeans the element content ratio of oxygen (O). The element content ratioof each element of the light absorption layer may be measured by amethod which is generally used in a field to which the technologybelongs and the element content ratio may be measured by using X-rayphotoelectron spectroscopy (XPS) or Electron Spectroscopy for ChemicalAnalysis (ESCA, Thermo Fisher Scientific Inc.).

According to an embodiment of the present specification, the thicknessparameter Tx may be may be in the range of 0.51 to 1, preferably in therange of 0.6 to 1, and more preferably in the range of 0.65 to 1. Whenthe numerical range is satisfied, the cool tone may be more clearlyobserved in the decoration member.

In an embodiment of the present specification, the content ratioparameter ax may be in the range of 0.1 to 5, 0.1 to 3, 0.1 to 1.5, and1 to 1.5, and more preferably, 1.1 to 1.3. When the numerical range issatisfied, the cool tone may be more clearly observed in the decorationmember. The ratio between the elements may be achieved by controlling agas fraction during deposition of the copper nickel oxide.

Specifically, using X-ray photoelectron spectroscopy (XPS) or electronspectroscopy for Chemical Analysis (ESCA, Thermo Fisher ScientificInc.), the survey scan in the surface and thickness direction of thelight absorption layer is performed and a qualitative analysis isperformed and then the quantitative analysis is performed by a narrowscan. In this case, the survey scan and the narrow scan are obtainedunder a condition of Table 1 below to perform the qualitative andquantitative analyses. Peak background adopts a smart scheme.

TABLE 1 Scan interval Element binding Energy Step size Narrow (Snapshot)20.89 eV 0.1 eV Survey −10~1350 eV 1 eV

In addition, the component analysis may be performed by preparing alight absorbing layer fragment having the same composition as the lightabsorption layer, before the decoration member is laminated.Alternatively, when a structure of the decoration member is thesubstrate/the pattern layer/the light reflection layer/the lightabsorption layer, an outermost edge of the decoration member may beanalyzed by the aforementioned method. Further, the light absorptionlayer may be visually confirmed by observing a cross-sectionalphotograph of the decoration member. For example, when the structure ofthe decoration member is the substrate/the pattern layer/the lightreflection layer/the light absorption layer, it may be confirmed thatthe interface exists between respective layers in the cross-sectionalphotograph of the decoration member and the outermost edge layercorresponds to the light absorption layer.

In an embodiment of the present specification, a Hue-angle h* in a CIELCh color space of the light absorption layer may be in the range of 105to 315°, in the range of 120 to 305°, in the range of 135 to 305° and inthe range of 150 to 305°, and in the range of 200 to 305°.

When the Hue-angle h* is in the range, the cool tone may be observedfrom the decoration member. The cool tone means that the numerical rangeis satisfied in the CIE LCh color space. The color corresponding to thewarm tone is illustrated in FIG. 32 and the color corresponding to thecool tone is illustrated in FIG. 33.

In an embodiment of the present specification, L in the CIE LCh colorspace of the light absorption layer may be in the range of 0 to 100 or30 to 100.

In an embodiment of the present specification, C in the CIE LCh colorspace of the light absorption layer may be in the range of 0 to 100, 1to 80, or 1 to 60.

In the present specification, the CIE LCh color space is a CIE Lab colorspace and here, instead of a* and b* of Cartesian Coordinates, cylindercoordinates C* (chroma, relative color saturation), L* (distance from Laxis), and h* (Hue-angle, Hue-angle in CIE Lab hue circle) are used.

In an embodiment of the present specification, a refractive index n ofthe light absorption layer at a wavelength of 400 nm may be preferablyin the range of 0 to 8, and in the range of 0 to 7, in the range of 0.01to 3, and in the range of 2 to 2.5. The refractive index n may becalculated as sin θa/sin θb (θa represents an angle of light incident onthe surface of the light absorption layer and θb represents an angle ofrefraction of light inside the light absorption layer).

In an embodiment of the present specification, the refractive index n ofthe light absorption layer in a wavelength range of 380 to 780 nm may bepreferably in the range of 0 to 8, and in the range of 0 to 7, in therange of 0.01 to 3, and in the range of 2 to 2.5.

In an embodiment of the present specification, the extinctioncoefficient k of the light absorption layer at the wavelength of 400 nmmay be in the range of more than 0 and 4 or less and preferably in therange of 0.01 to 4 and in the range of 0.01 to 3.5, in the range of 0.01to 3, and in the range of 0.1 to 1. The extinction coefficient krepresents −λ/4πI (dI/dx) (where the extinction coefficient represents apath unit length dx in the light absorption layer, for example, a valueacquired by multiplying a reduction fraction dI/I of light intensity permeter by λ/4π, where X represents the wavelength of light).

In an embodiment of the present specification, the extinctioncoefficient k of the light absorption layer in the wavelength range of380 to 780 nm may be preferably in the range of more than 0 and 4 orless and in the range of 0.01 to 4 and in the range of 0.01 to 3.5, inthe range of 0.01 to 3, and in the range of 0.1 to 1. Since theextinction coefficient k is in the range in an entire visible lightwavelength range of 400 nm or 380 nm to 780 nm, the entire visible lightwavelength range of 400 nm or 380 nm to 780 nm may serve as the lightabsorption layer within a visible light range.

As described above, a principle of expressing the color of the lightabsorption layer having a specific extinction coefficient and refractiveindex and a principle of color expression of the decoration memberexpressing the color by adding a dye to a conventional substrate aredifferent. For example, a case of using a scheme of absorbing light byadding a dye to a resin and a case of using a material having theextinction coefficient as described above are different from each otherin terms of a spectrum of absorbing light. When the dye is added to theresin to absorb light, an absorption wavelength band is fixed, and onlya phenomenon in which the amount of absorption changes with a change incoating thickness occurs. In addition, in order to obtain a desiredlight absorption amount, a thickness change of at least severalmicrometers or more is required to adjust the light absorption amount.On the other hand, in a material having the extinction coefficient, evenif the thickness varies on a scale of several or tens of nanometers, awavelength band of absorbed light changes.

In addition, when the dye is added to the conventional resin, only aspecific color by the dye is expressed, and thus various colors may notbe exhibited. On the other hand, the light absorption layer of thepresent invention has an advantage in that by using a specific materialrather than the resin, the color may be variously exhibited by aninterference phenomenon of light without the addition of the dye.

According to the embodiments, the light is absorbed on an incident pathand a reflection path of the light in the light absorption layer andfurther, the light is reflected on each of the surface of the lightabsorption layer and the interface between the light absorption layer301 and the light reflection layer 201 and two reflected light isconstructively supplemented and destructively interfered.

In the present specification, the light reflected from the surface ofthe light absorption layer may be represented by surface reflected lightand the light reflected from the interface between the light absorptionlayer and the light reflection layer may be represented by interfacereflected light. FIG. 4 is a schematic diagram of such an operationprinciple. In FIG. 4, a structure in which the substrate 101 is providedon the light reflection layer 201 is illustrated, but the presentspecification is not limited thereto and the position of the substrate101 may be disposed at a different position therefrom.

In an embodiment of the present specification, the light absorptionlayer may be constituted by a single layer or two layers or more ofmultiple layers.

In an embodiment of the present specification, the light absorptionlayer may further comprise one or two or more selected from a groupconsisting of metal, metalloid, and oxide, nitride, oxynitride, andcarbide of the metal or the metalloid. The oxide, nitride, oxynitride,or carbide of the metal or the metalloid may be formed by a depositioncondition set by those skilled in the art, etc. The light absorptionlayer may comprise the same metal, metalloid, two or more alloys oroxynitrides as the light reflection layer.

In an embodiment of the present specification, the thickness T₁ of thelight absorption layer may be determined according to a desired color ina final structure, and for example, may be 31 nm or more and 300 nm orless, 31 nm or more and 60 nm or less, 91 nm or more and 120 nm or less,or 151 nm or more and 180 nm or less.

In an embodiment of the present specification, the material of the lightreflection layer is not particularly limited as long as the material isa material capable of reflecting light, but the light reflectance may bedetermined according to the material, and for example, the color iseasily implemented at a light reflectance of 50% or more. The lightreflectance may be measured using an ellipsometer.

In an embodiment of the present specification, the light reflectionlayer may be a metal layer, a metal oxide layer, a metal nitride layer,a metal oxynitride layer, or an inorganic layer. The light reflectionlayer may be constituted by a single layer or constituted by two or moremultiple layers.

In an embodiment of the present specification, the light reflectionlayer may be constituted by a single layer or multiple layers comprisingone or two or more types of materials selected from the group consistingof indium (In), titanium (M), and tin (Sn), silicon (Si), germanium(Ge), aluminum (Al), copper (Cu), nickel (Ni), vanadium (V), tungsten(W), tantalum (Ta), molybdenum (Mo), neodymium (Nb), iron (Fe), chromium(Cr), cobalt (Co), gold (Au), and silver (Ag) and one or two or moretypes of materials selected from the group consisting of an oxide, anitride, or an oxynitride thereof and carbon and a carbon composite.

In an embodiment of the present specification, the light reflectionlayer may comprise two or more alloys selected from the above materials,oxides, nitrides or oxynitrides thereof.

In an embodiment of the present specification, the light reflectionlayer is manufactured by using an ink comprising carbon or a carboncomposite to implement a high resistance reflection layer. The carbon orcarbon composite comprises carbon black, CNT, and the like.

In an embodiment of the present specification, the ink comprising thecarbon or carbon composite material may comprise the above-describedmaterial or an oxide, a nitride, or an oxynitride thereof and comprise,for example, one or two or more types of oxides selected from the groupconsisting of indium (In), titanium (Ti), and tin (Sn), silicon (Si),germanium (Ge), aluminum (Al), copper (Cu), nickel (Ni), vanadium (V),tungsten (W), tantalum (Ta), molybdenum (Mo), neodymium (Nb), Iron (Fe),chromium (Cr), cobalt (Co), gold (Au), and silver (Ag). A curing processmay be additionally performed after printing the ink comprising thecarbon or carbon composite.

In an embodiment of the present specification, when the light reflectionlayer comprises two or more kinds of materials, two or more kinds ofmaterials may be formed by one process, for example, a deposition orprinting method, but a method for first forming the layer with one ormore kinds of materials and then additionally forming the layer thereonwith one or more kinds of materials may be used. For example, the layeris formed by depositing indium or tin and then the ink comprising thecarbon is printed and then cured, thereby forming the light reflectionlayer. The ink may additionally comprise oxide such as titanium oxide orsilicon oxide.

In an embodiment of the present specification, the thickness of thelight reflection layer may be determined according to a desired color ina final structure, and for example, may be 1 nm or more and 100 nm orless, 10 nm or more and 90 nm or less, or 30 nm or more and 90 nm orless.

(Light Absorption Layer Structure)

In an embodiment of the present specification, the light absorptionlayer may exhibit various shapes by adjusting a deposition condition andthe like when forming the light absorption layer.

In an embodiment of the present specification, the light absorptionlayer comprises two or more points having different thicknesses.

In an embodiment of the present specification, the light absorptionlayer comprises two or more regions having different thicknesses.

In an embodiment of the present specification, the light absorptionlayer may comprise an inclined surface.

The example of the structure according to the embodiment is illustratedin FIGS. 5 and 6. FIGS. 5 and 6 illustrate a structure in which thelight reflection layer 201 and the light absorption layer 301 arelaminated (not illustrated). According to FIGS. 5 and 6, the lightabsorption layer 301 has two or more points having differentthicknesses. According to FIG. 5, the thicknesses of the lightabsorption layer 301 at points A and B are different from each other.According to FIG. 6, the thicknesses of the light absorption layer 301at region C and region D are different from each other.

In an embodiment of the present specification, the light absorptionlayer comprises at least one region in which a top surface has aninclined surface having an inclination angle greater than 0 degree and90 degrees or smaller and the light absorption layer comprises at leastone region having a thickness different from a thickness in a regionhaving any one inclined surface. In regard to the inclined surface, anangle formed by any one straight line included in the top surface of thelight absorption layer and a straight line parallel to the lightreflection layer may be defined as the inclined surface. For example,the inclined angle of the top surface of the light absorption layer ofFIG. 5 may be approximately 20 degrees.

A surface characteristic such as the gradient of the top surface of thelight reflection layer may be the same as that of the light absorptionlayer. For example, by using the deposition method at the time offorming the light absorption layer, the top surface of the lightabsorption layer may have the same gradient as the top surface of thelight reflection layer. However, the gradient of the top surface of thelight absorption layer of FIG. 5 is different from the gradient of thetop surface of the light reflection layer.

The structure of the decoration member having the light absorption layerin which the top surface has the inclined surface is illustrated in FIG.7. In a structure in which the substrate 101, the light reflection layer201, and the light absorption layer 301 are laminated, a thickness t₁ inregion E of the light absorption layer 301 and a thickness t2 in regionF are different from each other. Reference numeral 401 may be a colorfilm.

FIG. 7 relates to a light absorption layer having a structure in whichinclined surfaces facing each other, i.e., cross sections have atriangular shape. As illustrated in FIG. 7, in the structure of apattern having the inclined surfaces facing each other, the thicknessesof the light absorption layer on two surfaces having a triangularstructure may be different from each other even though the deposition isperformed under the same condition. As a result, a light absorptionlayer having two or more regions with different thicknesses may beformed only by one process. Accordingly, an expression color variesdepending on the thickness of the light absorption layer. In this case,when the thickness of the light reflection layer is a predeterminedvalue or more, the thickness does not affect the color change.

In FIG. 7, a structure in which the substrate 101 is provided on thelight reflection layer 201 is illustrated, but the present specificationis not limited to such a structure and the position of the substrate 101may be disposed at a different position therefrom as described above.

Further, a surface of the substrate 101 of FIG. 7 contacting the lightreflection layer 201 is a flat surface, but a surface of the lightreflection layer 201 contacting the light reflection layer 201 of thesubstrate 101 may have a pattern having the same gradient as the topsurface of the light reflection layer 201. This is illustrated in FIG.8. In this case, there may be a difference even in thickness of thelight absorption layer due to the difference in slope of the pattern ofthe substrate. However, the present specification is not limited theretoand even though the substrate and the light absorption layer are made tohave different slopes by using a different deposition method, dichroismto be described below may be exhibited by differentiating thethicknesses of the light absorption layer at both sides of the pattern.

In an embodiment of the present specification, the light absorptionlayer comprises one or more regions in which the thickness graduallychanges. In FIG. 9, a structure in which the thickness of the lightabsorption layer 301 gradually changes is illustrated.

In an embodiment of the present specification, the light absorptionlayer comprises at least one region in which the top surface has aninclined surface having an inclination angle greater than 0 degree and90 degrees or smaller and at least one region having the inclinedsurface has a structure in which the thickness of the light absorptionlayer gradually changes. The structure of the light absorption layercomprising the region in which the top surface has the inclined surfaceis illustrated in FIG. 9. Both regions G and H of FIG. 9 have astructure in which the top surface of the light absorption layer has theinclined surface and the thickness of the light absorption layergradually changes.

In the present specification, the structure in which the thickness ofthe light absorption layer changes means that the cross section in thethickness direction of the light absorption layer comprises a pointwhere the thickness of the light absorption layer is smallest and apoint where the thickness of the light absorption layer is largest andthe thickness of the light absorption layer increases according to adirection of the point where the thickness of the light absorption layeris smallest to the point where the thickness of the light absorptionlayer is largest. In this case, the point where the thickness of thelight absorption layer is smallest and the point where the thickness ofthe light absorption layer is largest may mean any point on theinterface between the light absorption layer and the light reflectionlayer.

In an embodiment of the present specification, the light absorptionlayer may comprise a first region having a first inclined surface inwhich the inclined angle is in the range of 1 to 90 degrees and mayfurther comprise two or more regions in which the top surface has aninclined surface having a different inclination direction from the firstinclined surface or a different inclined angle from the first inclinedsurface or the top surface is horizontal. In this case, the thicknessesof the light absorption layer in the first region and the two or moreregions may be all different from each other.

(Substrate)

In an embodiment of the present specification, the decoration membercomprises a substrate provided on one surface of the color expressionlayer.

In an embodiment of the present specification, the decoration membercomprises a substrate 101 provided on at least one of a surface of thelight reflection layer 201 facing the light absorption layer 301; or asurface of the light absorption layer facing the light reflection layer.For example, the substrate may be provided on an opposite surface to asurface of the light reflection layer facing the light absorption layer(FIG. 10(a)); or an opposite surface to a surface of the lightabsorption layer facing the light reflection layer (FIG. 10(b)).

In an embodiment of the present specification, the substrate maycomprise a plastic injection molding or a glass substrate for a cosmeticcase. More specifically, the plastic injection molding may comprise atleast one of polypropylene (PP), polystyrene (PS), polyvinylacetate(PVAc), polyacrylate, polyethylene terephthalate (PET), polyvinylchloride (PVC), polymethyl methacrylate (PMMA), ethylene-vinyl acetatecopolymer (EVA), polycarbonate (PC), polyamide, andstyrene-acrylonitrile copolymer (SAN), but is not limited thereto.

Further, the plastic injection molding may be a flat-type plasticinjection molding without a curve (specific pattern) or a plasticinjection molding with the curve (specific pattern).

The plastic injection molding may be produced by a plastic moldingmethod. The plastic molding methods comprise compression molding,injection molding, air blow molding, thermoforming, hot melt molding,foam molding, roll molding reinforced plastic molding, and the like. Thecompression molding is a molding method for putting and heating thematerial in a mold and then applying pressure and the compressionmolding as the oldest molding method may be primarily used for moldingof a thermosetting resin such as a phenol resin. The injection moldingis a molding method in which a plastic melt liquid is pushed into atransporter and filled in the mold through a nozzle, and both athermoplastic resin and the thermosetting resin may be molded and may bethe most commonly used molding method. A resin currently used as thecosmetic case is SAN. The air blow molding is a method for molding aproduct by inserting a plastic parison into the center of the mold andinjecting air, and as a molding method for manufacturing a plasticbottle or a small case is very fast in manufacturing speed of theproduct.

In an embodiment of the present specification, as the glass substrate, aglass having a transmittance of 80% or more may be used.

In an embodiment of the present specification, the thickness of thesubstrate may be selected as necessary and may have a range of 50 to 200μm, for example.

In an embodiment of the present specification, the decoration member maybe manufactured by forming the light reflection layer on the substrateand the light absorption layer provided on the light reflection layer.More specifically, in the decoration member, the light absorption layerand the light reflection layer may be sequentially formed on thesubstrate using a deposition process, and the like, and the lightreflection layer and the light absorption layer may be sequentiallyformed on the substrate using the deposition process or the like, butthe present invention is not limited thereto.

(Color Film)

In an embodiment of the present specification, the color expressionlayer further comprises a color film.

In an embodiment of the present specification, the decoration memberfurther comprises a color film on an opposite surface to a surface ofthe light absorption layer facing the light reflection layer, betweenthe light absorption layer and the light reflection layer, or on anopposite surface to the surface of the light reflection layer facing thelight absorption layer. The color film may serve as the substrate. Forexample, a dye or a pigment is added to a film used as the substrate tobe used as the color film.

In an embodiment of the present specification, if the color film is afilm in which a color difference ΔE*ab which is a distance in a space ofL*a*b* on the color coordinates CIE L*a*b* of the color expression layerexceeds 1 when the color film exists as compared with a case where thecolor film is not provided, the color film is not particularly limited.

The color may be represented by CIE L * a * b * and the color differencemay be defined using a distance ΔE * ab in the L * a * b * space.Specifically, ΔE=√{square root over (ΔL⁺²+Δa⁺²+Δb⁺²)} and an observermay not recognize the color difference within the range of 0<ΔE*ab<1[Reference Document: Machine Graphics and Vision 20(4):383-411].Accordingly, in the present specification, the color differencedepending on the addition of the color film may be defined as ΔE*ab>1.

FIG. 11 illustrates the color expression layer comprising the colorfilm, FIG. 11(a) illustrates a structure in which the light reflectionlayer 201, the light absorption layer 301, and the color film 401 aresequentially laminated, FIG. 11(b) illustrates a structure in which thelight reflection layer 201, the color film 401, and the light absorptionlayer 301 are sequentially laminated, and FIG. 1(c) illustrates astructure in which the color film 401, the light reflection layer 201,and the light absorption layer 301 are sequentially laminated.

In an embodiment of the present specification, when the substrate isprovided on the opposite surface to the surface of the light reflectionlayer facing the light absorption layer and the color film is located onthe opposite surface to the surface of the light reflection layer facingthe light absorption layer, the color film may be provided between thesubstrate and the light reflection layer or on the opposite surface ofthe surface of the substrate facing the light reflection layer. Asanother example, when the substrate is provided on the opposite surfaceto the surface of the light absorption layer facing the light absorptionlayer and the color film is located on the opposite surface to thesurface of the light absorption layer facing the light reflection layer,the color film may be provided between the substrate and the lightabsorption layer or on the opposite surface of the surface of thesubstrate facing the light absorption layer.

In an embodiment of the present specification, the substrate is providedon the opposite surface of the surface of the light reflection layerfacing the light absorption layer and the color film is additionallyprovided. FIG. 12(a) illustrates a structure in which a color film 401is provided on the opposite surface of the light absorption layer 301 tothe reflection layer 201, FIG. 12(b) illustrates a structure in whichthe color film 401 is provided between the light absorption layer 301and the light reflection layer 201, FIG. 12(c) illustrates a structurein which the color film 401 is provided between the light reflectionlayer 201 and the substrate 101, and FIG. 12(d) illustrates a structurein which the color film 401 is provided on the opposite surface of thesubstrate 101 to the light reflection layer 201. FIG. 12(e) illustratesa structure in which color films 401 a, 401 b, 401 c, and 401 d areprovided on the opposite surface of the light absorption layer 310 tothe light reflection layer 201, between the light absorption layer 301and the light reflection layer 201, between the light reflection layer201 and the substrate 101, and on the opposite surface of the substrate101 to the light reflection layer 201 and the present invention is notlimited thereto and one to three may be omitted among the color films401 a, 401 b, 401 c, and 401 d.

In an embodiment of the present specification, the substrate is providedon the opposite surface of the surface of the light absorption layerfacing the light reflection layer. FIG. 13(a) illustrates a structure inwhich the color film 401 is provided on the opposite surface of thesubstrate 101 to the light absorption layer 301, FIG. 13(b) illustratesa structure in which the color film 401 is provided between thesubstrate 101 and the light absorption layer 301, FIG. 13(c) illustratesa structure in which the color film 401 is provided between the lightabsorption layer 301 and the light reflection layer 201, and FIG. 13(d)illustrates a structure in which the color film 401 is provided on theopposite surface of the light reflection layer 201 to the lightabsorption layer 301. FIG. 13(e) illustrates a structure in which colorfilms 401 a, 401 b, 401 c, and 401 d are provided on the oppositesurface of the substrate 101 to the light absorption layer 310, betweenthe substrate 101 and the light absorption layer 301, between the lightabsorption layer 301 and the light reflection layer 201, and on theopposite surface of the light reflection layer 201 to the lightabsorption layer 301 and the present invention is not limited theretoand one to three may be omitted among the color films 401 a, 401 b, 401c, and 401 d.

In the structures illustrated in FIGS. 12(b) and 13(c), when visiblelight transmittance of the color film is greater than 0%, the lightreflection layer may reflect light incident through the color film,thereby implementing the color by laminating the light absorption layerand the light reflection layer.

In the structures illustrated in FIGS. 12(c), 12(d), and 13(d), it ispreferable that the light transmittance of the color expressed from thecolor film of the light reflection layer 201 is 1% or more, preferably3% or more, and more preferably 5% or more so as to recognize a colordifference change due to the addition of the color film. The reason isthat the transmitted light may be mixed with the color by the color filmin the range of the visible light transmittance.

In an embodiment of the present specification, the color film may beprovided in a state in which one sheet or two or more homogeneous orheterogeneous sheets are laminated.

As the color film, a color film may be used, which may express a desiredcolor in combination with the color expressed from the laminatedstructure of the light reflection layer and the light absorption layerdescribed above. For example, a color film in which one or two or moreof pigments and dyes are dispersed in a matrix resin and exhibit thecolor may be used. The color film as described above may be formed bycoating a color film forming composition directly to a position wherethe color film may be provided or there may be used a method for coatingthe color film forming composition on a separate substrate, or arrangingor attaching the color film at the position where the color film may beprovided after preparing the color film by using a known molding methodsuch as casting, extrusion, or the like. The coating method may adoptwet coating or dry coating.

Pigments and dyes that may be included in the color film may be selectedfrom those known in the art so as to achieve a desired color from thefinal decoration member, and may adopt one or two or more among red,yellow, purple, blue, pink series pigments and dyes. Specifically, dyescomprising a perinone-based red dye, an anthraquinone-based red dye, amethine-based yellow dye, an anthraquinone-based yellow dye, ananthraquinone-based violet dye, a phthalocyanine-based blue dye, athioindigo-based pink dye, and an isoxindigo-based pink dye may be usedalone or in combination. Pigments comprising carbon black, copperphthalocyanine (C.I. Pigment Blue 15:3), C.I. Pigment Red 112, Pigmentblue, and Isoindoline yellow may be used alone or in combination. As thedye or pigment as described above, commercially available dyes orpigments may be used, and materials such as Ciba ORACET Co., Ltd. andChokwang Paint Co., Ltd. may be used. The types of dyes or pigments andcolors of the dyes or pigments are only examples, and various known dyesor pigments may be used, thereby implementing more various colors.

As the matrix resin included in the color film, materials known asmaterials such as a transparent film, a primer layer, an adhesive layer,and a coating layer may be used, and are not particularly limitedthereto. For example, various materials comprising acrylic resins,polyethylene terephthalate resins, urethane resins, linear olefinresins, cycloolefin resins, epoxy resins, triacetyl cellulose resins,and the like may be selected, and copolymers of the above exemplifiedmaterials or mixtures may also be used.

When the color film is disposed closer to the position for observing thedecoration member than the light reflection layer or the lightabsorption layer, for example, in the structures illustrated in FIGS.12(a) and 12(b), FIGS. 13(a), 13(b), and (c), the light transmittance ofthe color expressed from the light reflection layer, the lightabsorption layer, or a lamination structure of the light reflectionlayer and the light absorption layer in the color film is 1% or more,preferably 3% or more, and more preferably 5% or more. Accordingly, thecolor expressed from the color film and the color expressed from thelight reflection layer, the light absorption layer, or the laminationstructure thereof are together combined to achieve the desired color.

The thickness of the color film is not particularly limited, and if thedesired color may be represented, one of those skilled in the art mayselect and set the thickness. For example, the thickness of the colorfilm may be 500 nm to 1 mm.

(Pattern Layer)

In an embodiment of the present specification, the color expressionlayer or substrate may comprise a pattern layer.

In an embodiment of the present specification, the substrate comprisesthe pattern layer and the pattern layer is provided adjacent to thecolor expression layer.

In the present specification, a case where the pattern layer is providedadjacent to the color expression layer may mean that the pattern layerdirectly contacts the color expression layer. For example, the patternlayer may directly contact the light reflection layer of the colorexpression layer or the pattern layer may directly contact the lightabsorption layer of the color expression layer.

In an embodiment of the present specification, the pattern layercomprises a convex or concave shape having a cross section of anasymmetrical structure.

In an embodiment of the present specification, the pattern layercomprises the convex shape having the cross section of the asymmetricalstructure.

In an embodiment of the present specification, the pattern layercomprises the concave shape having the cross section of the asymmetricalstructure.

In an embodiment of the present specification, the pattern layercomprises a convex shape having a cross section of an asymmetricstructure and a concave shape having the cross section of the asymmetricstructure.

In the present specification, the “cross section” means the surface atthe time of cutting the convex or concave in any one direction. Forexample, when the decoration member is placed on the ground, the crosssection may mean a surface when the convex or concave is cut in adirection parallel to the ground or perpendicular to the ground. Thesurface having the convex or concave shape of the pattern layer of thedecoration member according to the embodiment is characterized in thatat least one of cross sections perpendicular to the ground has theasymmetric structure.

In the present specification, the “cross section of the asymmetricstructure” means that a figure configured by a periphery of the crosssection has a structure which does not have line symmetry or pointsymmetry. The line symmetry refers to a case where a property is shownin which when a predetermined figure is made to be symmetric around onestraight line, the figure is overlapped. The point symmetry means a casewhere a symmetrical property is shown in which when a predeterminedfigure rotates at 180 degrees around one point, the predetermined figurecompletely overlaps with an original figure. Here, the periphery of thecross section of the asymmetric structure may be the straight line, acurved line, or a combination thereof.

In the present specification, the “convex shape” may comprise one ormore “convex unit shapes” and the “concave shape” may comprise one ormore “concave unit shapes”. The convex unit shape or the concave unitshape means a shape comprising two inclined sides (a first inclined sideand a second inclined side) and is not a shape comprising three or moreinclined sides. Referring to FIG. 21, a convex shape P1 of a circle C1has a convex unit shape comprising a first inclined side and a secondinclined side. However, a convex shape contained in a circle C2comprises two convex unit shapes. Each first inclined side may bedefined as a left inclined side of the convex shape or the concave shapeand each second inclined side may mean a right inclined side of theconvex shape or the concave shape.

As described above, the decoration member may express the dichroism bythe convex or concave having the cross section of the asymmetricstructure included in the surface of the pattern layer. The dichroismmeans that different colors are observed depending on the viewing angle.The color may be represented by CIE L * a * b * and the color differencemay be defined using a distance ΔE * ab in the L * a * b * space.Specifically, the color difference is ΔE·ab=√{square root over((ΔL)²+(Δa)²+(Δb)²)} and an observer may not recognize the colordifference within the range of 0<ΔE*ab<1 [Reference Document: MachineGraphics and Vision 20(4):383-411]. Accordingly, in the presentspecification, the dichroism may be defined as ΔE*ab>1.

In an embodiment of the present specification, the color expressionlayer has the dichroism of ΔE*ab>1. Specifically, the color differenceΔE*ab which is a distance in the space of L*a *b* on the colorcoordinates CIE L*a*b* of the color expression layer may be greater thanone.

In an embodiment of the present specification, the decoration member hasthe dichroism of ΔE*ab>1. Specifically, the color difference ΔE*ab whichis a distance in the space of L*a *b* on the color coordinates CIEL*a*b* in the entire decoration member may be greater than one.

FIG. 14 exemplarily illustrates a decoration member comprising a patternlayer according to an embodiment of the present specification (thesubstrate and a protective layer are not illustrated). The surface ofthe pattern layer may have a shape in which a second convex P2 which issmaller in height than the convex is disposed between the convexes P1.Hereinafter, the convex described before the second convex may be calledthe first convex.

FIG. 15 illustrates an example of the decoration member comprising thepattern layer according to an embodiment of the present specification(the color expression layer is not illustrated). The surface of thepattern layer may have a shape in which a tip portion (pointed portion)of the convex P1 further comprises a concave P3 smaller in height thanthe convex. The decoration member may show an effect that an image coloris slightly changed depending on the viewing angle.

In an embodiment of the present specification, the pattern layer maycomprise the convex or concave shape and each shape may be arranged inan inverted structure.

FIG. 16 illustrates an example of the decoration member comprising thepattern layer according to an embodiment of the present specification.As illustrated in FIG. 16(a), the surface of the pattern layer may havea shape in which a plurality of convexes is arranged in the invertedstructure at 180 degrees. Specifically, the surface of the pattern layermay comprise a first region C1 in which the second inclined surface hasa larger inclined angle than the first inclined surface and a secondregion C2 in which the second inclined surface has a larger inclinedangle than the first inclined surface. In one example, the convexincluded in the first region may be referred to as the first convex P1and the convex included in the second region may be referred to as afourth convex P4. The contents described in the items of the convex P1may be similarly applied to the height, the width, and the inclinedangles of the first and fourth convexes P1 and P4 and the angle formedby the first and second inclined surfaces may adopt. As illustrated inFIG. 16(b), one of the first region and the second region may correspondto an image or a logo, and the other region may correspond to abackground part. The decoration member may show an effect that the colorof the image or log is slightly changed depending on the viewing angle.Further, the decoration member may show a decoration effect that thecolors of the image or log part are seen exchanged according to theviewing direction.

In an embodiment of the present specification, each of the first regionand the second region may comprise a plurality of convexes. The widthsof the first and second regions and the numbers of convexes of the firstand second regions may be appropriately adjusted by considering the sizeof a targeted image or the logo.

In the present specification, inclined angles a2 and a3 of the convex Pmay mean angles formed by inclined surfaces S1 and S2 of the convex P1and a horizontal surface of the pattern layer. Unless particularlymentioned in the present specification, the first inclined surface inthe drawing may be defined as the left inclined surface of the convexand the second inclined surface may mean the right inclined surface ofthe convex.

In an embodiment of the present specification, the cross section of theconvex P1 of the pattern layer may have a polygonal shape and a columnarshape extending in one direction. In one example, the cross section ofthe convex P1 may be a triangle or have a shape further comprising asmall concave at a tip (a pointed portion or a vertex portion) of thetriangle.

In an embodiment of the present specification, an angle a1 formedbetween the first inclined surface S1 and the second inclined surface S2may be in the range of 80 to 100 degrees. The angle a1 may be,specifically, 80 degrees or more, 83 degrees or more, 86 degrees ormore, or 89 degrees or more, and may be 100 degrees or less, 97 degreesor less, 94 degrees or less, or 91 degrees or less. The angle may referto an angle of a vertex formed between the first inclined surface andthe second inclined surface. When the first inclined surface and thesecond inclined surface do not form the vertex with each other, theangle may mean an angle of a vertex in a state in which a vertex isformed by virtually extending the first inclined surface and the secondinclined surface.

In an embodiment of the present specification, a difference between theinclination angle a2 of the first inclined surface and an inclinationangle a3 of the second inclined surface of the convex P1 may be in therange of 30 to 70 degrees. The difference between the inclination anglea2 of the first inclined surface and the inclination angle a3 of thesecond inclined surface may be, for example, 30 degrees or more, 35degrees or more, 40 degrees or more, or 45 degrees or more, and may be70 degrees or less, 65 degrees or less, 60 degrees or less or 55 degreesor less. When the difference between the inclination angles of the firstinclined surface and the second inclined surface is within the aboverange, it may be advantageous in terms of implementation of colorrepresentation according to a direction. That is, the dichroism may beshown larger.

In an embodiment of the present specification, the height H1 of theconvex P may be 5 μm to 30 μm. If the height of the convex is within theabove range, it may be advantageous in terms of production process. Inthe present specification, the height of the convex may mean theshortest distance between the highest portion and the lowest portion ofthe convex with respect to a horizontal plane of the pattern layer. Inthe description relating to the height of the convex, the same numericalrange may be applied even to the depth of the concave described above.

In an embodiment of the present specification, the width W1 of theconvex P1 may be 10 μm to 90 μm. If the width of the convex is withinthe above range, it may be advantageous in terms of process forprocessing and forming the pattern. The width W1 of the convex P1 maybe, for example, 10 μm or more, 15 μm or more, 20 μm or more, or 25 μmor more, 90 μm or less, 80 μm or less, 70 μm or less, 60 μm or less, 50μm or less, 40 μm or less, or 35 μm or less. Descriptions relating tothis width may apply not only to the convexes, but also to the concavesdescribed above.

In an embodiment of the present specification, an interval between theconvexes P1 may be 0 μm to 20 μm. In the present specification, theinterval between the convexes may mean the shortest distance between anend point of one convex and a start point of the other convex of twoadjacent convexes. If the interval between the convexes is properlymaintained, the decoration member should have a relatively bright colorwhen viewed from an inclined surface having a larger inclination angleof the convex, and a phenomenon that the reflection area is dark due toshading may be improved. As described later, a second convex having asmaller height than the convex may exist between the convexes.Descriptions relating to this interval may apply not only to theconvexes, but also to the concaves described above.

In an embodiment of the present specification, a height H2 of the secondconvex P2 may have a range of ⅕ to ¼ of the height H1 of the firstconvex P1. For example, a difference (H1−H2) between the heights of thefirst convex and the second convex may be 10 μm to 30 μm. The width W2of the second convex may be 1 μm to 10 μm. The width W2 of the secondconvex may be specifically 1 μm or more, 2 μm or more, 3 μm or more, 4μm or more, or 4.5 μm or more, and may be 10 μm or less, 9 μm or less, 8μm or less, 7 μm or less, 6 μm or less, or 5.5 μm or less.

In an embodiment of the present specification, the second convex mayhave two inclined surfaces S3 and S4 having different inclinationangles. An angle a4 formed between the two inclined surfaces of thesecond convex may be 20 degrees to 100 degrees. Specifically, the anglea4 may be 20 degrees or more, 30 degrees or more, 40 degrees or more, 50degrees or more, 60 degrees or more, 70 degrees or more, 80 degrees ormore, or 85 degrees or more, and may be 100 degrees or less or 95degrees or less. A difference (a6−a5) between the inclination angles ofboth inclined surfaces of the second convex may be 0 to 60 degrees. Thedifference (a6−a5) of the inclination angle may be 0 degrees or more, 10degrees or more, 20 degrees or more, 30 degrees or more, 40 degrees ormore, or 45 degrees or more, and may be 60 degrees or less or 55 degreesor less. When the dimension of the second convex is within the aboverange, it may be advantageous in that the inflow of light is increasedon the side having a large inclination angle to form a bright color.

In an embodiment of the present specification, the height H3 of theconcave P3 may be 3 μm to 15 μm. The height H3 of the concave P3 may bespecifically 3 μm or more, and may be 15 μm or less, 10 μm or less, or 5μm or less. The concave may have two inclined surfaces S5 and S6 havingdifferent inclination angles. An angle a7 formed between the twoinclined surfaces of the concave may be 20 degrees to 100 degrees.Specifically, the angle a7 may be 20 degrees or more, 30 degrees ormore, 40 degrees or more, 50 degrees or more, 60 degrees or more, 70degrees or more, 80 degrees or more, or 85 degrees or more, and may be100 degrees or less or 95 degrees or less. A difference (a9−a8) betweenthe inclination angles of both inclined surfaces of the concave may be 0to 60 degrees. The difference (a9−a8) of the inclination angle may be 0degrees or more, 10 degrees or more, 20 degrees or more, 30 degrees ormore, 40 degrees or more, or 45 degrees or more, and may be 60 degreesor less or 55 degrees or less. When the dimension of the concave is inthe above range, it may be advantageous in terms of adding color in amirror surface.

In an embodiment of the present specification, the pattern layercomprises a convex shape, and the cross section of the convex shapecomprises a first inclined side and a second inclined side, and theshapes of the first inclined side and the second inclined side are thesame as or different from each other, and have straight or curvedshapes, respectively.

FIG. 17 illustrates an example of the decoration member comprising thepattern layer according to an embodiment of the present specification.The cross section of the pattern layer has a convex shape, and the crosssection of the convex comprises a first region D1 comprising the firstinclined side and a second region D2 comprising the second inclinedside. The first inclined side and the second inclined side have straightshapes. An angle c3 between the first inclined side and the secondinclined side may be 75 degrees to 105 degrees, or 80 degrees to 100degrees. An angle c1 between the first inclined side and the ground andan angle c2 between the second inclined side and the ground aredifferent from each other. For example, a combination of c1 and c2 maybe 20 degrees/80 degrees, 10 degrees/70 degrees or 30 degrees/70degrees.

FIG. 18 illustrates an example of the decoration member comprising thepattern layer according to an embodiment of the present specification.The cross section of the pattern layer has a convex shape, and the crosssection of the convex shape comprises a first region E1 comprising thefirst inclined side and a second region E2 comprising the secondinclined side. At least one of the first inclined side and the secondinclined side may have a curved shape. For example, both the firstinclined side and the second inclined side may have curved shapes, thefirst inclined side may have a straight shape, and the second inclinedside may have a curved shape. When the first inclined side has astraight shape and the second inclined side has a curved shape, theangle c1 may be greater than the angle c2. FIG. 18 illustrates that thefirst inclined side has a straight shape, and the second inclined sidehas a curved shape. The angle between the inclined side having a curvedshape and the ground may be calculated from an angle formed by astraight line and the ground when an arbitrary straight line is drawnfrom a point where the inclined side meets the ground to a point wherethe first inclined side meets the second inclined side. The secondinclined side having the curved shape may have a different degree ofcurvature according to the height of the pattern layer, and the curvedline may have a radius of curvature. The radius of curvature may be 10times or less larger than the width (E1+E2) of the convex shape. FIG.18(a) shows that the radius of curvature of the curve line is twice thewidth of the convex shape, and FIG. 18(b) shows that the radius ofcurvature of the curved line is one time the width of the convex shape.A ratio of a curvature portion E2 to the width (E1+E2) of the convex maybe 90% or less. FIGS. 18(a) and 18(b) show that the ratio of thecurvature portion E2 to the width (E1+E2) of the convex is 60%.

In an embodiment of the present specification, the cross section of theconvex shape may have a polygonal shape of a triangle or quadrangle.

FIG. 19 illustrates an example of the decoration member comprising thepattern layer according to an embodiment of the present specification.The cross section of the pattern layer may have a convex shape, and thecross section of the convex shape may have a quadrangular shape. Thequadrangular shape may be a general quadrangular shape, and is notparticularly limited as long as the inclination angles of the inclinedsides are different from each other. The quadrangular shape may be aform remaining by partially cutting off a triangle. For example, thequadrangular shape may be a quadrangular trapezoid in which a pair offacing sides are parallel to each other, or a quadrangular shape inwhich a pair of facing sides parallel to each other do not exist. Theconvex-shaped cross section comprises a first region F1 comprising afirst inclined side, a second region F2 comprising a second inclinedside, and a third region F3 comprising a third inclined side. The thirdinclined side may or not be parallel to the ground. For example, whenthe quadrangular shape is trapezoidal, the third inclined side isparallel to the ground. At least one of the first inclined side to thethird inclined side may have a curved shape and the details of thecurved shape are as described above. The length of the sum of F1+F2+F3may be defined as the width of the convex shape, and the details of thewidth are as described above.

In an embodiment of the present specification, the pattern layer maycomprise two or more convex shapes, and may further comprise a flatportion in a part or all between the convex shapes.

FIG. 20 illustrates an example of the decoration member comprising thepattern layer according to an embodiment of the present specification. Aflat portion may be included between convexes of the pattern layer. Theflat portion means a region where no convex exists. Except that thepattern layer further comprises a flat portion, the description of othercomponents (D1, D2, c1, c2, c3, the first inclined side and the secondinclined side) is as described above. On the other hand, the length ofthe sum of D1+D2+G1 is defined as a pitch of the pattern, which has adifference from the width of the pattern described above.

In an embodiment of the present specification, the surface of the convexor concave shape comprises two or more convex or the concave shapes. Assuch, dichroism can be made larger by having the surface of two or moreconvex or concave shapes. In this case, two or more convex or concaveshapes may be a repeated form of the same shape, but different shapesmay be included.

In an embodiment of the present specification, the convex or concaveshape having the cross section of the asymmetric structure comprises twoor more sides in which at least one cross section has differentinclination angles, different degrees of curvature, or different shapes.For example, when two sides of sides constituting at least one crosssection have different inclination angles, different degrees ofcurvature, or different shapes, the convex or the concave has anasymmetrical structure.

In an embodiment of the present specification, the shape of the convexor the concave comprises a first inclined side and a second inclinedside of which inclination angles of at least one cross-section aredifferent from each other.

In the present specification, unless otherwise indicated, the “side” maybe a straight line, but is not limited thereto, and all or part of sidesmay be curved. For example, the sides may comprise a portion of an arcof a circle or ellipse, a wave structure, a structure such as zigzag,and the like.

In the present specification, when the side comprises a portion of anarc of a circle or an ellipse, the circle or ellipse may have a radiusof curvature. The radius of curvature may be defined as a radius of thearc when an extremely short section of the curved line is converted intoan arc.

In the present specification, unless otherwise indicated, the term“inclined side” means a side of which an angle between the side and theground is more than 0 degrees and 90 degrees or less when the decorationmember is placed on the ground. At this time, when the side is astraight line, the angle between the straight line and the ground may bemeasured. When the side comprises a curve line, when the decorationmember is placed on the ground, an angle between the straight lineconnecting a point of the side closest to the ground and a point of theside furthest from the ground at a shortest distance and the ground maybe measured.

In the present specification, unless otherwise stated, an inclinationangle is more than 0 degree and 90 degrees or less as an angle between asurface or side constituting the pattern layer and the ground, when thesaid decoration member is placed on the ground. Alternatively, theinclination angle may mean an angle formed between the ground and asegment (a′−b′) generated when connecting a point a′ where the surfaceor side of the pattern layer is in contact with the ground and a pointb′ where the surface or side of the pattern layer is furthest from theground to each other.

In the present specification, unless otherwise stated, the degree ofcurvature refers to a degree of change in a slope of a tangent atsuccessive points on the side or surface. The greater the change in theslope of the tangent at successive points on the side or surface, thegreater the degree of curvature.

In the present specification, the convex may have a convex unit shape,and the concave may have a concave unit shape. The convex unit shape orthe concave unit shape means a shape comprising two inclined sides (afirst inclined side and a second inclined side) and is not a shapecomprising three or more inclined sides. Referring to FIG. 21, a convexP1 of a circle C1 has a convex unit shape comprising a first inclinedside and a second inclined side. However, a shape contained in a circleC2 comprises two convex unit shapes. The first inclined side may bedefined as a left inclined side of the convex or the concave, and thesecond inclined side may mean a right inclined side of the convex or theconcave.

In an embodiment of the present specification, an angle a1 formedbetween the first inclined side and the second inclined side may be in arange of 80 degrees to 100 degrees. The angle a1 may be, specifically,80 degrees or more, 83 degrees or more, 86 degrees or more, or 89degrees or more, and may be 100 degrees or less, 97 degrees or less, 94degrees or less, or 91 degrees or less. The angle may refer to an angleof a vertex formed between the first inclined side and the secondinclined side. When the first inclined side and the second inclined sidedo not form a vertex with each other, the angle may mean an angle of avertex in a state in which a vertex is formed by virtually extending thefirst inclined side and the second inclined side.

In an embodiment of the present specification, a difference between theinclination angle a2 of the first inclined side and an inclination anglea3 of the second inclined side of the convex P1 may be in a range of 30degrees to 70 degrees. The difference between the inclination angle a2of the first inclined side and the inclination angle a3 of the secondinclined side may be, for example, 30 degrees or more, 35 degrees ormore, 40 degrees or more, or 45 degrees or more, and may be 70 degreesor less, 65 degrees or less, 60 degrees or less or 55 degrees or less.When the difference between the inclination angles of the first inclinedside and the second inclined side is within the above range, it may beadvantageous in terms of implementation of color representationaccording to a direction.

FIG. 22 exemplarily shows a pattern layer of a decoration member and amethod of manufacturing the same according to an embodiment of thepresent specification. The cross section of the pattern layer may have aconvex shape, and the cross section of the convex shape may have a shapein which a specific region of a ABO1 triangle shape is removed. Themethod of determining the specific region to be removed is as follows.The contents of inclination angles c1 and c2 are the same as describedabove.

1) Set any point P1 on an AO1 segment that divides the AO1 segment at aratio of L1:L2.

2) Set any point P2 on a BO1 segment that divides the BO1 segment at aratio of m1:m2.

3) Set any point O2 on an AB segment that divides the AB segment at aratio of n1:n2.

4) Set any point P3 on a O1O2 segment that divides an O2O1 segment at aratio of o1:o2.

In this case, the ratios of L1:L2, m1:m2, n1:n2 and o1:o2 may be thesame as or different from each other, and each independently 1:1000 to1000:1.

5) Remove an area formed by a polygon of P1O1P2P3.

6) Set a shape formed by a polygon of ABP2P3P1 as a cross section of theconvex.

The pattern layer may be modified in various forms by adjusting theratios of L1:L2, m1:m2, n1:n2 and o1:o2. For example, when the L1 and m1increase, the height of the pattern may increase, and when the o1increases, the height of the concave formed on the convex may decrease,and a position of the lowest point of the concave formed in the convexmay be adjusted close to either of the inclined sides of the convex byadjusting a ratio of n1.

FIG. 23 exemplarily illustrates a pattern layer manufactured by themethod of manufacturing the pattern layer of the decoration member ofFIG. 22. When the ratios of L1:L2, m1:m2, and o1:o2 are all the same aseach other, the cross section may have a trapezoidal shape. The heightsha and hb of the trapezoid may be varied by adjusting the ratio ofL1:L2. For example, FIG. 23(a) shows a pattern layer manufactured whenthe ratio of L1:12 is 1:1 and FIG. 23(b) shows a pattern layermanufactured when the ratio of L1:L2 is 2:1.

In an embodiment of the present specification, the convex or concaveshape of the surface of the pattern layer may be a cone-shaped convexprotruding out of the surface of the pattern layer or a cone-shapedconcave recessed inside the surface of the pattern layer.

In an embodiment of the present specification, the cone shape comprisesa shape of a cone, an elliptical cone, or a polypyramid. Here, the shapeof the bottom surface of the polypyramid comprises a triangle, a square,and a star shape having five or more protruding points. According to anexample, when the decoration member is placed on the ground, when thesurface of the pattern layer has a cone-shaped convex shape, at leastone of vertical cross sections of the convex shape with respect to theground may have a triangular shape. According to another example, whenthe decoration member is placed on the ground, when the surface of thepattern layer has a cone-shaped concave shape, at least one of verticalcross sections of the concave shape with respect to the ground may havean inverse triangular shape.

In an embodiment of the present specification, the cone-shaped convex orthe cone-shaped concave shape may have at least one cross section of anasymmetric structure. For example, when the cone-shaped convex portionor the cone-shaped concave portion is observed from the surface side ofthe convex portion or the concave shape, when two or less identicalforms exist when rotating 360 degrees from the vertex of the cone, it isadvantageous in expressing the dichroism. FIG. 24 shows the cone-shapedconvex shape observed from the surface side of the convex shape, inwhich a) shows cone shapes having a symmetrical structure, and b)illustrates cone shapes of an asymmetric structure.

When the decoration member is placed on the ground, the cone shape ofthe symmetrical structure has a regular polygon of which a cross section(hereinafter, referred to as a horizontal cross section) in a directionhorizontal to the ground is a circle or a length of each side is thesame, and the vertex of the cone is a structure existing on a lineperpendicular to the cross section of the center of gravity of thehorizontal cross section for the ground. However, when viewed from thesurface side of the cone-shaped convex or concave shape, a cone shapehaving a cross section of an asymmetric structure is a structure inwhich a position of the vertex of the cone exists on the vertical lineof the point that is not the center of gravity of the horizontal crosssection of the cone or a structure in which a horizontal cross sectionof the cone is a polygon or ellipse of an asymmetric structure. When thehorizontal cross section of the cone is a polygon of an asymmetricstructure, at least one of sides or angles of the polygon may bedesigned differently from other sides or angles.

For example, as shown in FIG. 25, the position of the vertex of the conemay be changed. Specifically, as shown in the first picture of FIG. 25,when the vertex of the cone is designed to be located on the verticalline of the center O1 of gravity of the horizontal cross section withrespect to the ground of the cone when observed from the surface side ofthe con-shaped convex shape, four identical structures may be obtainedwhen rotating at 360 degrees based on the vertex of the cone (4 foldsymmetry). However, the symmetrical structure is broken by designing thevertices of the cone at a position O2 other than the center O1 ofgravity of the horizontal cross section with respect to the ground. Whena length of one side of the horizontal cross section with respect to theground is x, moving distances of vertexes of the cone are a and b, aheight of the cone shape which is a length of the line connectedvertically from the vertex 01 or 02 of the cone to the horizontal crosssection with respect to the ground is h, and an angle formed between thehorizontal cross section and the side surface of the cone is θn, acosine value may be obtained as described below with respect to surfaces1, 2, 3 and 4 of FIG. 25.

${\cos ( {\Theta \; 1} )} = \frac{( \frac{x}{2} )}{{sqrt}( {h^{2} + ( \frac{x}{2} )^{2}} )}$${\cos ( {\Theta \; 2} )} = \frac{( \frac{x}{2} )}{{sqrt}( {h^{2} + ( \frac{x}{2} )^{2}} )}$$\begin{matrix}{{\cos ( {\Theta \; 3} )} = \frac{( {\frac{x}{2} - a} )}{{sqrt}( {h^{2} + ( {\frac{x}{2} - a} )^{2}} )}} \\{{\cos ( {\Theta \; 4} )} = \frac{( {\frac{x}{2} - b} )}{{sqrt}( {h^{2} + ( {\frac{x}{2} - b} )^{2}} )}}\end{matrix}$

At this time, since θ1 and θ2 are the same, there is no dichroism.However, since θ3 and θ4 are different from each other, and |θ3−θ4|means a color difference ΔE*ab between two colors, dichroism may beexhibited. Here, |θ3−θ4|>0. As such, by using the angle between thehorizontal cross section and the side surface of the ground of the cone,it is possible to quantitatively indicate how the symmetrical structureis broken, that is, the degree of asymmetry, and the numerical valuerepresenting the degree of asymmetry is proportional to the colordifference of the dichroism.

FIG. 26 shows a surface of which the highest point has a linear convexshape, in which a) illustrates a pattern having convexes that do notexpress dichroism, and b) shows a pattern having convexes expressingdichroism. Across section X-X′ of FIG. 26 a) is an isosceles triangle oran equilateral triangle, and a cross section Y-Y′ of FIG. 26 b) is atriangle having different side lengths.

In an embodiment of the present specification, the pattern layer has asurface of which the highest point is a linear convex shape or thelowest point is a linear concave shape. The linear shape may be astraight line shape, and a curved line shape, may comprise both a curvedline and a straight line, or may be a zigzag shape. This is illustratedin FIGS. 27 to 29. When the surface of which the highest point is alinear convex shape or the lowest point is a linear concave shape isviewed from the surface side of the convex or concave shape, it isadvantageous to express dichroism when there is only one identical formwhen rotating 360 degrees based on the center of gravity of thehorizontal cross section with respect to the ground of the convex or theconcave.

In an embodiment of the present specification, the pattern layer has aconvex or concave-shaped surface of a structure in which the tip of thecone shape is cut off. FIG. 30 shows a photograph embodying an invertedtrapezoidal concave with an asymmetrical cross section perpendicular tothe ground when the decoration member is placed on the ground. Such anasymmetric cross section may be trapezoidal or inverted trapezoidalshape. Even in this case, dichroism may be expressed by the crosssection of an asymmetric structure.

In addition to the structure illustrated above, various convex orconcave-shaped surfaces as shown in FIG. 31 may be implemented.

In the present specification, unless otherwise indicated, the “surface”may be a flat surface, but is not limited thereto, and all or part ofsurfaces may be a curved surface. For example, the surfaces may comprisea shape of the cross section in the vertical direction to the surface isa part of an are of a circle or ellipse, a wave structure, a zigzagstructure, or the like.

In an embodiment of the present specification, the pattern layercomprises a pattern of a symmetrical structure. The symmetricalstructure comprises a prismatic structure, a lenticular lens structure,and the like.

In an embodiment of the present specification, the decoration membercomprises a pattern layer comprising a convex or concave shape with across section having an asymmetrical structure on a surface of the lightabsorption layer facing the light reflection layer; between the lightabsorption layer and the light reflection layer, or on a surface of thelight reflection layer facing the light absorption layer.

In an embodiment of the present specification, the pattern layer mayhave a flat portion on a surface opposite to the surface where theconvex or concave shape is formed, and the flat portion may be formed ona substrate. A plastic substrate may be used as the substrate layer.Examples of the plastic substrate may comprise triacetyl cellulose(TAC); cyclo olefin copolymer (COP) such as norbornene derivatives;poly(methyl methacrylate (PMMA); polycarbonate (PC); polyethylene (PE);polypropylene (PP); polyvinyl alcohol (PVA); diacetyl cellulose (DAC);polyacrylate (Pac); poly ether sulfone (PES); polyetheretherketon(PEEK); polyphenylsulfone (PPS), polyetherimide (PEI);polyethylenenaphthatlate (PEN); polyethyleneterephtalate (PET);polyimide (PI); polysulfone (PSF); polyarylate (PAR) or an amorphousfluorine resin, etc., but are not limited thereto.

In an embodiment of the present specification, the pattern layer maycomprise a thermosetting resin or an ultraviolet curable resin. Aphotocurable resin or a thermosetting resin may be used as the curableresin. An ultraviolet curable resin may be used as the photocurableresin. As the thermosetting resin, for example, silicone resin, siliconresin, fran resin, polyurethane resin, epoxy resin, amino resin, phenolresin, urea resin, polyester resin, melamine resin, etc. may be used,but is not limited thereto. The ultraviolet curable resin may typicallycomprise acrylic polymers such as polyester acrylate polymers,polystyrene acrylate polymers, epoxy acrylate polymers, polyurethaneacrylate polymers or polybutadiene acrylate polymers, silicone acrylatepolymers or alkyl acrylate polymers, etc., but is not limited thereto.

In an embodiment of the present specification, a color dye may befurther included inside or on at least one surface of the pattern layer.The comprising of the color dye on at least one surface of the patternlayer may mean, for example, a case where the color dye is included inthe above-described substrate layer provided on a flat portion side ofthe pattern layer.

In an embodiment of the present specification, the color dye maycomprise anthraquinone-based dyes, phthalocyanine-based dyes,thioindigo-based dyes, perinone-based dyes, isoxindigo dyes,methane-based dyes, monoazo-based dyes, and 1:2 metal complex-baseddyes.

In an embodiment of the present specification, when the pattern layercomprises a color dye therein, a scheme of adding a dye to the curableresin may be applied. When a color dye is further included in the lowerportion of the pattern layer, a scheme of coating a layer containing thedye on the upper or lower portion of the substrate layer may be applied.

In an embodiment of the present specification, the content of the colordye may be, for example, 0 to 50 wt %. The content of the color dye maydetermine the transmittance and haze range of the pattern layer and thedecoration member, the transmittance may be, for example, 20% to 90%,and the haze may be, for example, 1% to 40%.

In an embodiment of the present specification, the color expressionlayer may impart a metallic texture and a depth effect of color whenviewing the decoration member. The color expression layer may bedisplayed in various colors according to a viewing angle of an image ofthe decoration member. This is because a wavelength of light passingthrough the pattern layer and reflected from the surface of an inorganiclayer is changed according to a wavelength of the incident light.

The color expression layer may have the same convex or concave as thesurface of the pattern layer described above. The color expression layermay have the same gradient as the surface of the pattern layer describedabove.

In an embodiment of the present specification, the decoration membercomprises a protective layer provided between the substrate and thecolor expression layer, on a surface of the color expression layerfacing the substrate; or on a surface of the substrate facing the colorexpression layer.

In an embodiment of the present specification, the decoration membercomprises a protective layer provided on at least one of between thesubstrate and the pattern layer, between the pattern layer and the lightreflection layer, between the light reflection layer and the lightabsorption layer, and an opposite surface of the surface of the lightabsorption layer facing the light reflection layer. That is, theprotective layer serves to protect the decoration member by beingprovided between the respective layers of the decoration member or atthe outermost side of the decoration member. In the presentspecification, the “protective layer” means a layer capable ofprotecting other layers of the decoration member, unless otherwisedefined. For example, the inorganic layer may be prevented fromdeteriorating in a moisture or heat resistant environment.Alternatively, scratching of the inorganic layer or the pattern layerdue to external factors may be effectively suppressed, so that thedichroism of the decoration member may be effectively expressed.

In the present specification, the term “inorganic layer” means a lightabsorption layer or a light reflection layer, unless otherwise defined.

In the present specification, an example of a decoration memberstructure comprising the protective layer is as follows.

For example, the decoration member may have a structure ofsubstrate/protective layer/pattern layer/light reflection layer/lightabsorption layer/protective layer or substrate/protective layer/patternlayer/light absorption layer/light reflection layer/protective layer.

In an embodiment of the present specification, the protective layercomprises aluminum oxynitride. Since the protective layer comprisesaluminum oxynitride (AlON), a function of the protective layer to bedescribed later may be increased as compared with a case where theprotective layer does not comprise aluminum oxynitride (AlON). Inaddition, when adjusting a ratio of each element of aluminum oxynitride,the protective function may be further improved.

In an embodiment of the present specification, the decoration memberfurther comprises a protective layer, so that damage to the patternlayer and the inorganic layer is suppressed even when left in a hightemperature and high humidity environment, and thus an excellentdecorative effect may be maintained even in a poor environment.

The decoration member of the present specification may be applied to aknown object in need of application. For example, the present inventionmay be applied to portable electronic devices, electronic products,cosmetic containers, furniture, building materials, and the like withoutlimitation.

The method of applying the decoration member to portable electronicdevices, electronic products, cosmetic containers, furniture, buildingmaterials, and the like is not particularly limited, and a known methodknown as a method of applying a decoration film in the art may beapplied. The decoration member may further comprise an adhesive layer asnecessary. In another example, the decoration member may be applied toportable electronic devices or electronic products by direct coating. Inthis case, a separate adhesive layer for attaching the decoration memberto portable electronic devices or electronic products may not berequired. In another example, the decoration member may be attached toportable electronic devices or electronic products through the adhesivelayer. The adhesive layer may use an optically clear adhesive tape (OCAtape) or an adhesive resin. As the OCA tape or the adhesive resin, OCAtapes or adhesive resins known in the art may be applied withoutlimitation. If necessary, a release liner for protecting the adhesivelayer may be further provided.

In an embodiment of the present specification, the light reflectionlayer and the light absorption layer may be formed on the substrate or apattern of the pattern layer of the substrate by a sputter method, anevaporation method, a vapor deposition method, chemical vapor deposition(CVD), wet coating, or the like, respectively. In particular, since thesputtering method is straight, it is possible to maximize a differencein deposition thickness of both inclined surfaces of the convex bytilting a position of a target.

In an embodiment of the present specification, the light reflectionlayer and the light absorption layer may be formed by a reactivesputtering method, respectively. The reactive sputtering is a method inwhich energetic ions (e.g., Ar⁺) apply shocks a target material and atarget material released at this time is deposited on the surface to bedeposited. In this case, the base pressure may be 1.0×10⁻⁵ Torr or less,6.0×10⁻⁶ Torr or less, preferably 3.0×10⁻⁶ Torr or less.

In an embodiment of the present specification, the reactive sputteringmethod may be performed in a chamber containing plasma gas and reactivegas. The plasma gas may be argon (Ar) gas. In addition, the reactivegases required for forming the inorganic layer are oxygen (O₂) andnitrogen (N₂), which are gases for providing oxygen or nitrogen atoms,and are distinguished from plasma gases.

In an embodiment of the present specification, a flow rate of the plasmagas may be 10 sccm or more and 300 sccm or less, preferably 20 sccm ormore and 200 sccm or less. The sccm means Standard Cubic Centimeter Perminute.

In an embodiment of the present specification, a process pressure p1 inthe chamber may be 1.0 mTorr to 10.0 mTorr, preferably 1.5 mTorr to 10.0mTorr. If the process pressure is higher than the above range duringsputtering, Ar particles present in the chamber increase, and particlesreleased from the target collide with the Ar particles to lose energy,thereby decreasing the growth rate of the thin film. On the other hand,if the process pressure is maintained too low, the energy loss of coppernickel oxide particles by Ar particles is reduced, but there is adisadvantage that the particles having high energy may damage thesubstrate or deteriorate the quality of the protective layer.

In an embodiment of the present specification, a fraction of thereactive gas to the plasma gas may be 30% or more and 70% or less,preferably 40% or more and 70% or less, and more preferably 50% or moreand 70% or less. The fraction of the reactive gas may be calculated as(Q_(reactive gas)/(Q_(plasma process gas))*100%). The Q_(reactive gas)means a flow rate of the reactive gas in the chamber andQ_(plasma process gas) may be a flow rate of the plasma process gas inthe chamber. When the numerical range is satisfied, an atomic ratio ofthe copper nickel oxide described above may be adjusted to a desiredrange.

In an embodiment of the present specification, the driving power of thereactive sputtering method may be 100 W or more and 500 W or less,preferably 150 W or more and 300 W or less.

In an embodiment of the present specification, the voltage applied inthe reactive sputtering method may be in a range of 350 V or more and500 V. The range of the voltage may be adjusted according to the stateof the target, the process pressure, the driving power (process power)or the fraction of the reactive gas.

In an embodiment of the present specification, a deposition temperatureof the reactive sputtering method may be 20° C. or more and 300° C. orless. When deposited at a temperature lower than the above range, thereis a problem in that the crystallinity of the thin film growth isdeteriorated due to insufficient energy necessary for crystal growth ofparticles released from the target and arriving at the substrate. At atemperature higher than the above range, there is a problem in that theparticles released from the target are evaporated or re-evaporated andthus the thin film growth rate is deteriorated.

Mode for Invention

Hereinafter, the present application will be described in detail withreference to Examples, but the scope of the present specification is notlimited by the following Examples.

EXAMPLES AND COMPARATIVE EXAMPLES Comparative Example 1

An ultraviolet curable resin was applied onto a PET substrate to form aprism-shaped pattern layer having an inclination angle of 20 degrees/70degrees. Thereafter, a color expression layer comprising a lightabsorption layer and a light reflection layer was formed on the patternlayer by using reactive sputtering.

Specifically, reactive sputtering was used, and a copper and nickeltarget (target weight ratio wt % was Cu:Ni=98: 2) was used. The flowrate of argon gas was 35 sccm, the flow rate of oxygen gas was adjustedto 15 sccm, the process pressure was 9 mTorr, and the power wasmaintained at 200 W. Through this, a light absorption layer of 10 nmhaving a composition of Table 2 was formed. Then, In of a thickness of70 nm was deposited on the light absorption layer by sputtering to forma light reflection layer, thereby manufacturing a final decorationmember.

Comparative Example 2

A decoration member was manufactured in the same manner as inComparative Example 1 except that the thickness of a light absorptionlayer was adjusted to 20 nm.

Comparative Example 3

A decoration member was manufactured in the same manner as inComparative Example 1 except that the thickness of a light absorptionlayer was adjusted to 30 nm.

Example 1

A decoration member was manufactured in the same manner as inComparative Example 1 except that the thickness of a light absorptionlayer was adjusted to 40 nm.

Example 2

A decoration member was manufactured in the same manner as inComparative Example 1 except that the thickness of a light absorptionlayer was adjusted to 50 nm.

Example 3

A decoration member was manufactured in the same manner as inComparative Example 1 except that the thickness of a light absorptionlayer was adjusted to 60 nm.

Comparative Example 4

A decoration member was manufactured in the same manner as inComparative Example 1 except that a target weight ratio wt % of copperand nickel was changed to Cu:Ni=69:31.

Comparative Example 5

A decoration member was manufactured in the same manner as inComparative Example 4 except that the thickness of a light absorptionlayer was adjusted to 20 nm.

Comparative Example 6

A decoration member was manufactured in the same manner as inComparative Example 4 except that the thickness of a light absorptionlayer was adjusted to 30 nm.

Example 4

A decoration member was manufactured in the same manner as inComparative Example 4 except that the thickness of a light absorptionlayer was adjusted to 40 nm.

Example 5

A decoration member was manufactured in the same manner as inComparative Example 4 except that the thickness of a light absorptionlayer was adjusted to 50 nm.

Example 6

A decoration member was manufactured in the same manner as inComparative Example 4 except that the thickness of a light absorptionlayer was adjusted to 60 nm.

Comparative Example 7

A decoration member was manufactured in the same manner as inComparative Example 1 except that a target weight ratio wt % of copperand nickel was changed to Cu:Ni=29:71.

Comparative Example 8

A decoration member was manufactured in the same manner as inComparative Example 7 except that the thickness of a light absorptionlayer was adjusted to 20 nm.

Comparative Example 9

A decoration member was manufactured in the same manner as inComparative Example 7 except that the thickness of a light absorptionlayer was adjusted to 30 nm.

Example 7

A decoration member was manufactured in the same manner as inComparative Example 7 except that the thickness of a light absorptionlayer was adjusted to 40 nm.

Example 8

A decoration member was manufactured in the same manner as inComparative Example 7 except that the thickness of alight absorptionlayer was adjusted to 50 nm.

Example 9

A decoration member was manufactured in the same manner as inComparative Example 7 except that the thickness of alight absorptionlayer was adjusted to 60 nm.

TABLE 2 Thickness of light Thickness Component ratio at each position(CuaNibOx) absorption layer parameter Tx a b c σ_(x) ω value (T₁)(Equation 2) (*10⁻²) (*10⁻²) (*10⁻²) (Equation 3) (Equation 1)Comparative 10 0.167 0.51 0.01 0.48 1.3 0.217 Example 1 Comparative 200.333 0.51 0.01 0.48 1.3 0.433 Example 2 Comparative 30 0.5 0.51 0.010.48 1.3 0.65 Example 3 Example 1 40 0.667 0.51 0.01 0.48 1.3 0.867Example 2 50 0.833 0.51 0.01 0.48 1.3 1.083 Example 3 60 1 0.51 0.010.48 1.3 1.3 Comparative 10 0.167 0.3 0.2 0.5 1.2 0.2 Example 4Comparative 20 0.333 0.3 0.2 0.5 1.2 0.4 Example 5 Comparative 30 0.50.3 0.2 0.5 1.2 0.6 Example 6 Example 4 40 0.667 0.3 0.2 0.5 1.2 0.8Example 5 50 0.833 0.3 0.2 0.5 1.2 1 Example 6 60 1 0.3 0.2 0.5 1.2 1.2Comparative 10 0.167 0.15 0.33 0.52 1.11 0.185 Example 7 Comparative 200.333 0.15 0.33 0.52 1.11 0.37 Example 8 Comparative 30 0.5 0.15 0.330.52 1.11 0.555 Example 9 Example 7 40 0.667 0.15 0.33 0.52 1.11 0.74Example 8 50 0.833 0.15 0.33 0.52 1.11 0.925 Example 9 60 1 0.15 0.330.52 1.11 1.11

Evaluation Example (Color Evaluation)

The component ratios of the decoration members manufactured in Examplesand Comparative Examples were analyzed, and colors shown for eachthickness were observed and recorded in Table 3 below.

TABLE 3 Lch coordinates L c h Color Comparative Example 1 69 78 71 Warmtone Comparative Example 2 54 59 54 Comparative Example 3 27 52 2Example 1 64  1 270 Cool tone Example 2 35 25 299 Example 3 53 11 264Comparative Example 4 62 15 74 Warm tone Comparative Example 5 56 35 50Comparative Example 6 30 31 27 Example 4 47 10 240 Cool tone Example 516 26 283 Example 6 34 20 246 Comparative Example 7 62 15 74 Warm toneComparative Example 8 58 36 54 Comparative Example 9 33 35 34 Example 745 11 243 Cool tone Example 8 15 27 303 Example 9 30 21 250

In the case of the decoration members of Comparative Examples 1 to 9, awarm tone was shown, whereas in the case of the decoration members ofExamples 1 to 9, a cool tone was shown. This is illustrated in FIG. 34.

When comparing Examples and Comparative Examples, even if thecompositions of the light absorption layers were the same as each other,it was confirmed that a warm or cool color was shown when the thicknesswas changed.

1. A decoration member comprising: a color expression layer comprising alight reflection layer and a light absorption layer provided on thelight reflection layer, and a substrate provided on one surface of thecolor expression layer, wherein the light absorption layer comprises acopper nickel oxide (Cu_(a)Ni_(b)O_(x)), and ω represented by Equation 1is in a range of 0.71 to
 3. when a component analysis is performed withrespect to any one point of the light absorption layer: $\begin{matrix}{\omega = {( T_{x} ) \times ( \sigma_{x} )}} & \lbrack {{Equation}\mspace{14mu} 1} \rbrack \\{{f( T_{1} )} = {\frac{T_{1}}{T_{0}}( {0 < T_{1} \leq T_{0}} )}} & \lbrack {{Equation}\mspace{14mu} 2} \rbrack \\{{f( T_{1} )} = {f( {T_{1} + {n \times T_{0}}} )}} & \; \\{\sigma_{x} = {\frac{a + b}{x} \times 1.2}} & \lbrack {{Equation}\mspace{14mu} 3} \rbrack\end{matrix}$ wherein in Equation 1, T_(x) represents a function valuedepending on T₁ of a function represented by the f(T₁), n represents apositive integer of 1 or more, and ax is represented by Equation 3,wherein in Equation 2, T₁ represents a thickness of the light absorptionlayer comprising any one point of the light absorption layer in whichthe component analysis is performed and T₀ is 60 nm, and wherein inEquation 3, the a means an element content ratio of copper (Cu), b meansan element content ratio of nickel (Ni), and x means an element contentratio of oxygen (O).
 2. The decoration member of claim 1, wherein theT_(x) is in a range of 0.51 to
 1. 3. The decoration member of claim 1,wherein σ_(x) is in a range of 0.1 to
 5. 4. The decoration member ofclaim 1, wherein a Hue-angle h* in CIE LCh color space of the lightabsorption layer is in a range of 105 to 315°.
 5. The decoration memberof claim 1, wherein the light reflection layer is constituted by asingle layer or multiple layers comprising one or more types ofmaterials selected from the group consisting of indium (In), titanium(Ti), tin (Sn), silicon (Si), germanium (Ge), aluminum (Al), copper(Cu), nickel (Ni), vanadium (V), tungsten (W), tantalum (Ta), molybdenum(Mo), neodymium (Nb), iron (Fe), chromium (Cr), cobalt (Co), gold (Au),and silver (Ag); an oxide, nitride, or an oxynitride thereof; carbon anda carbon composite.
 6. The decoration member of claim 1, wherein thelight absorption layer has a refractive index of 0 to 8 at a wavelengthof 400 nm.
 7. The decoration member of claim 1, wherein the lightabsorption layer has an extinction coefficient of greater than 0 andless than or equal to 4 at a wavelength of 400 nm.
 8. The decorationmember of claim 1, wherein the light absorption layer comprises two ormore points having different thicknesses.
 9. The decoration member ofclaim 1, wherein the color expression layer further comprises a colorfilm.
 10. The decoration member of claim 1, wherein the color expressionlayer or the substrate comprises a pattern layer.
 11. The decorationmember of claim 10, wherein the pattern layer comprises a convex orconcave shape having a cross section having an asymmetric structure. 12.The decoration member of claim 1, wherein the decoration member hasdichroism of ΔE*ab>1.
 13. The decoration member of claim 1, wherein thesubstrate comprises a plastic injection molding or a glass substrate fora cosmetic case.
 14. The decoration member of claim 13, wherein theplastic injection molding comprises at least one of polypropylene (PP),polystyrene (PS), polyvinylacetate (PVAc), polyacrylate, polyethyleneterephthalate (PET), polyvinyl chloride (PVC), polymethyl methacrylate(PMMA), ethylene-vinyl acetate copolymer (EVA), polycarbonate (PC),polyamide, and styrene-acrylonitrile copolymer (SAN).